Plasma Technology for Advanced Devices
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Scan day: 09 February 2014 UTC
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Description: A source of information for plasma etch and integration engineers with focus on frontend and transistor technology from Clarycon. Features news, white papers, events, and links.
Clarycon: Plasma Technology for Advanced Devices Plasma Technology for Advanced Devices Plasma etch challenges for FinFET transistors HP and Hynix to commercialize ReRAM Toshiba announces 24 nm NAND flash
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Page title: | Clarycon: Plasma Technology for Advanced Devices |
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IP-address: | 80.82.114.113 |
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NS | Name Server: NS.34SP.COM Name Server: NS2.34SP.COM |
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Date | Creation Date: 13-aug-2000 Expiration Date: 13-aug-2014 |