Tectra Plasma Sources
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Scan day: 03 February 2014 UTC
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Description: Provides the Tectra Plasma Source, a multi-purpose source producing either atoms or ions and finds uses in a range of HV and UHV applications.
Plasma Source as atom source, ion source and atom/ion hybrid source (microwave plasma source) plasma source, plasma ion source, ion source, ECR source, atom source, atom beam source, microwave plasma source, plasma, source, microwave ion source, broad beam ion source, RF plasma source, RF source, kaufman ion source, kaufmann ion source, kaufman source, kaufmann source, microwave, ECR, RF
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WEBSITE Info
| Page title: | Plasma Source as atom source, ion source and atom/ion hybrid source (microwave plasma source) |
| Keywords: | microwave ion source, plasma ion source, plasma source, microwave plasma source, atom beam source, downstream plasma source, atom source, ECR source, Kaufman ion source, Kaufman source, broad beam ion source, ion assisted deposition, IBAD, ion implantation, sputtering, cleaning, pre-cleaning, passivation, passivate lattice defects, ion etching, MBE, molecular beam epitaxy, UHV, ultra-high vacuum, ion beam depostion, Kaufmann source, Kaufmann-type, oxford, rf, new specification, new specs, nitriding, nitride, nitrogen, hydrogen, oxygen, plasma, GaN, GaAlN, 2.45GHz |
| Description: | tectra's new Gen2 Plasma Source which can be user configured as Atom Source, Ion Source or Atom/Ion Hybrid Source. As filamentless ECR microwave plasma source it can be used with reactive gases, not possible with Kaufman ion sources. |
| IP-address: | 82.165.88.226 |
WHOIS Info
| NS | |
| WHOIS | Status: connect |
| Date | Changed: 2007-04-17T06:33:12+02:00 Changed: 2008-09-23T15:53:37+02:00 Changed: 2008-09-23T15:53:37+02:00 |