University of Texas at Dallas Plasma Applications Laboratory
Edit Page
Report
Scan day: 17 February 2014 UTC
57
Virus safety - good
Description: Research of plasmas used in semiconductor processing. University of Texas at Dallas, USA.
Welcome to Lawrence J. Overzet's Web Pages UNDER RECONSTRUCTION (slowly...) THE PLASMA APPLICATIONS LABORATORY (PAL) Our research interests are primarily focused on the study of plasmas used in semiconductor processing. In particular, we have developed plasma diagnostics for semiconductor processing discharges and have extensive experience in determining plasma kinetics. We have also submitted patents for a high density plasma source, a plasma potential controller and a fast double Langmuir probe. We have sophisticated Langmuir probes, B-dot probes, microwave interferometers, an energy analyzing mass spectrometer and an ICCD camera with imaging spectrometer. We are always interested in industrially relevant projects and each graduate student routinely does a summer internship at a local company on a project related to plasma processing.
Size: 854 chars
Contact Information
Email:Send Message
Phone&Fax: —
Address: —
Extended: —
WEBSITE Info
Page title: | PLASMA APPLICATIONS LABORATORY |
Keywords: | Plasma Processing, Etching, Semiconductor processing, Plasma |
Description: | The Plasma Applications Laboratory |
IP-address: | 129.110.10.36 |
WHOIS Info
NS | Name Servers: IBEXT3.UTDALLAS.EDU 129.110.182.24 IBEXT4.UTDALLAS.EDU 129.110.180.24 |
WHOIS | |
Date | activated: 10-Nov-1988 last updated: 21-Mar-2013 expires: 31-Jul-2014 |