Lieberman, Michael A.
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Description: Plasma assisted materials processing and processing discharges, regular and chaotic dynamics. Plasma Processing Laboratory, University of California at Berkeley, USA.
Michael A. Lieberman | EECS at UC Berkeley Plasma-assisted materials processing Feature-Level Compensation and Control (FLCC) Michael Lieberman received his B.S. and M.S. degrees from the Massachusetts Institute of Technology in 1962 and his Ph.D. degree from MIT in 1966. He joined the Department of Electrical Engineering and Computer Sciences at UC Berkeley in 1966. In 1971, he received the Distinguished Teaching Award of the Berkeley campus. He was a Guggenheim Fellow during 1972-3. He is a Fellow of the American Physical Society (APS), the American Association for the Advancement of Science (AAAS), the Institute of Electrical and Electronic Engineers (IEEE), the American Vacuum Society, and the Institute of Physics (Great Britain). He received the IEEE Plasma Science and Applications Award in 1995, the von Engel Prize of the International Union of Pure and Applied Physics in 2005, and the Will Allis Prize for Study of Ionized Gases in 2006.
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| Page title: | Michael A. Lieberman | EECS at UC Berkeley |
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| IP-address: | 128.32.244.172 |
WHOIS Info
| NS | Name Servers: ADNS1.BERKELEY.EDU 128.32.136.3 ADNS2.BERKELEY.EDU 128.32.136.14 |
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| Date | activated: 24-Apr-1985 last updated: 28-May-2013 expires: 31-Jul-2014 |